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Materials for microlithography : radiation-sensitive polymers / L. F. Thompson, C. G. Willson, J. M. J. Frechet.

Contributor(s): Thompson, L. F | Willson, C. G | Frechet, J. M. J | American Chemical Society. Division of Polymeric Materials : Science and Engineering | American Chemical Society. Meeting (187th : 1984 : St.Louis, Mo.).
Material type: materialTypeLabelBookSeries: ACS symposium series, 0097-6156 ; 266. Publisher: Washington, D.C. : American Chemical Society, 1984Description: viii, 494 p. : ill. ; 24 cm.ISBN: 0841208719.Call number: 621.38173 MAT Subject(s): Lithography -- Congresses | Microelectronics -- Materials -- Congresses | Photoresists -- Congresses | Polymers and polymerization -- CongressesOnline resources: Click here to access online
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621.38173 MAT (Browse shelf) 1 Available 1000015333

Based on a symposium sponsored by the Division of Polymeric Materials Science and Engineering and the Division of Polymer Chemistry at the 187th Meeting of the American Chemical Society, St.Louis, Missouri, April 8-13, 1984.

Includes bibliographical references and index.

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